BALAKRISHNAN, G.; VELAVAN, R.; SYED NASER, S. Characterization of P-type Nickel Oxide (NiO) Thin Films Prepared by RF Magnetron Sputtering. Journal of Surface Science and Technology, [S. l.], v. 36, n. 1-2, p. 01–05, 2020. DOI: 10.18311/jsst/2020/22591. Disponível em: http://www.informaticsjournals.com/index.php/jsst/article/view/22591. Acesso em: 29 apr. 2024.