BASKAR, S.; NALINI, P. Influence of In-Situ Annealing of Si-Rich Silicon Carbide Thin Films. Journal of Surface Science and Technology, [S. l.], v. 34, n. 3-4, p. 116–120, 2019. DOI: 10.18311/jsst/2018/20097. Disponível em: http://www.informaticsjournals.com/index.php/jsst/article/view/20097. Acesso em: 29 apr. 2024.